Magnetoresistance of carbon-covered Co nanowires |
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Authors: | M Brands O Posth G Dumpich |
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Institution: | aFachbereich Physik, Experimentalphysik, AG Farle, Universität Duisburg-Essen, 47048 Duisburg, Germany |
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Abstract: | We have investigated the magnetoresistance of carbon-coated Co nanowires with various widths down to w=32 nm at low temperatures (T=4.2 K). The nanowires and their non-magnetic contact pads are prepared by means of a three-step electron beam lithography (EBL) process in a LEO secondary electron microscope. We obtain wires with highest quality by using specifically customized resist systems with undercut. The longitudinal magnetoresistance shows pronounced features at the coercive fields Hc—where Hc increases with decreasing wire width as —indicating a magnetization reversal process accomplished by domain nucleation and traversal. In contrast, the transverse and perpendicular magnetoresistance continuously decrease to their saturation values which can be understood in terms of a coherent rotation of the magnetization using the anisotropic magnetoresistance. |
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Keywords: | Magnetoresistance AMR Magnetization reversal |
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