| 355 nm激光作用下熔石英损伤增长 |
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| 引用本文： | 尹伟,徐世珍,祖小涛,蒋晓东,袁晓东,吕海兵,王成程,郑万国. 355 nm激光作用下熔石英损伤增长[J]. 强激光与粒子束, 2008, 20(12) |
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| 作者姓名： | 尹伟 徐世珍 祖小涛 蒋晓东 袁晓东 吕海兵 王成程 郑万国 |
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| 作者单位： | 电子科技大学,应用物理系,成都,610054;中国工程物理研究院,激光聚变研究中心,四川,绵阳,621900;电子科技大学,应用物理系,成都,610054;中国工程物理研究院,激光聚变研究中心,四川,绵阳,621900 |
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| 基金项目： | 国家高技术研究发展计划(863计划) |
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| 摘 要： | 用355 nm脉冲激光分别辐照位于熔石英前后表面的损伤点，用Mias软件采集了损伤增长的图像并测量了每脉冲辐照后损伤点的面积。实验结果表明：位于熔石英样片后表面的损伤点面积随激光辐照脉冲数呈指数增长关系，而位于前表面的损伤点面积与激光辐照脉冲次数呈线性增长关系。
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| 关 键 词： | 熔石英 前表面 后表面 激光损伤 |
| 收稿时间： | 1900-01-01; |
Growth of laser initiated damage in fused silica at 355 nm |
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| YIN Wei,XU Shi-zhen,ZU Xiao-tao,JIANG Xiao-dong,YUAN Xiao-dong,L Hai-bing,WANG Cheng-cheng,ZHENG Wan-guo. Growth of laser initiated damage in fused silica at 355 nm[J]. High Power Laser and Particle Beams, 2008, 20(12) |
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| Authors: | YIN Wei XU Shi-zhen ZU Xiao-tao JIANG Xiao-dong YUAN Xiao-dong L Hai-bing WANG Cheng-cheng ZHENG Wan-guo |
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| Affiliation: | 1. Department of Applied Physics, University of Electronic Science and Technology of China, Chengdu 610054, China; 2. Research Center of Laser Fusion, CAEP, P. O. Box 919-988-5, Mianyang 621900, China |
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| Abstract: | The damaged sites located on input and exit surface have been irradiated respectively with 355 nm pulse laser.After each shot,photograph of growth of the damaged site has been taken and the area of the damaged site has been measured.Experimental results show exponential growth in the lateral size of damage sites located on exit surface with shot number,whereas linear growth in the lateral site of damage sites located on input surface. |
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| Keywords: | fused silica input surface exit surface laser initiated damage |
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