Polybenzoxazine as a mold-release agent for nanoimprint lithography |
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| Authors: | Wang Chih-Feng Chiou Shih-Feng Ko Fu-Hsiang Chen Jem-Kun Chou Cheng-Tung Huang Chih-Feng Kuo Shiao-Wei Chang Feng-Chih |
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| Institution: | Department of Materials Science and Engineering, I-Shou University, 84008 Kaohsiung, Taiwan. |
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| Abstract: | One of the most important tasks remaining to be resolved in nanoimprint lithography is the elimination of the resist sticking to the mold during demolding. Previously, the main approach was to apply a thin layer of fluorinated alkyl silane mold-release agent on the surface on the mold; however, this involves complicated steps and high costs. The low surface free energy material polybenzoxazine provides an efficient mold-release agent for silicon molds that is easier to process, costs less, and has no side reactions. |
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