Influence of sputtering conditions on ionic conductivity of LiPON thin films |
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| Affiliation: | 1. Department of Materials Science and Engineering, University of Central Florida, Orlando, FL 32816, USA;2. Department of Civil, Environmental and Construction Engineering, University of Central Florida, Orlando, FL 32816, USA;3. Advanced Materials Processing and Analysis Center, University of Central Florida, Orlando, FL 32816, USA;4. NanoScience Technology Center, University of Central Florida, Orlando, FL 32816, USA;5. College of Medicine, University of Central Florida, Orlando, FL 32827, USA;6. Schlumberger, 14910 Airline Road, Rosharon, TX 77583, USA;7. Department of Electrical Engineering and Computer Science, University of Central Florida, Orlando, FL 32816, USA;8. Samsung Austin Semiconductor, 12100 Samsung Blvd #100, Austin, TX 78754, USA |
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| Abstract: | LiPON films were deposited using radio-frequency magnetron sputtering in a pure N2 gas atmosphere. The influence of rf power, N2 pressure, target–substrate distance and target density on thin film composition and ionic conductivity has been studied. Impedance measurements performed between 25 and 80 °C have indicated that ionic conductivity increases with nitrogen incorporation into the glass structure. An increase in the deposition rate with the target density has also been observed. |
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