Report on the 47th IUVSTA Workshop ‘Angle‐Resolved XPS: the current status and future prospects for angle‐resolved XPS of nano and subnano films’ |
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| Authors: | A Herrera‐Gomez J T Grant P J Cumpson M Jenko F S Aguirre‐Tostado C R Brundle T Conard G Conti C S Fadley J Fulghum K Kobayashi L Kövér H Nohira R L Opila S Oswald R W Paynter R M Wallace W S M Werner J Wolstenholme |
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| Institution: | 1. CINVESTAV‐Unidad Queretaro, Queretaro 76000, Mexico;2. Department of Materials Science and Engineering, The University of Texas at Dallas, Richardson, TX 75080, USA;3. Research Institute, University of Dayton, Dayton, OH 45469, USA;4. National Physical Laboratory, Teddington, Middlesex, UK;5. Institute of Metals and Technology, Ljubljana, Slovenia;6. C.R. Brundle and Associates, Soquel, CA, USA;7. IMEC/MCA, Leuven, Belgium;8. DTCL Group, Applied Materials, 3100 Bowers Ave, Santa Clara, CA, USA;9. Department of Physics, UC Davis & Materials Sciences Division, Lawrence Berkeley National Laboratory, CA, USA;10. Chemical and Nuclear Engineering, University of New Mexico, Albuquerque, NM, USA;11. SPring‐8, Kouto 1‐1‐1, Sayo‐cho, Sayo‐gun, Hyogo 679‐5198, Japan;12. Institute of Nuclear Research of the Hungarian Academy of Sciences, 18/c Bem tér, H‐4026 Debrecen, Hungary;13. Musashi Institute of Technology, 1‐28‐1 Tamazutsumi, Setagaya‐ku, Tokyo 158‐8557, Japan;14. Department of Materials Science and Engineering, University of Delaware, Newark, DE, USA;15. IFW Dresden, Postfach 270116, D‐01171 Dresden, Germany;16. INRS‐éMT, Varennes, Québec, Canada;17. Institut für Allgemeine Physik, Vienna, Austria;18. Thermo Fisher Scientific, The Birches Industrial Estate, Imberhorne Lane, East Grinstead, West Sussex, RH19 1UB, UK |
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| Abstract: | A summary of the workshop entitled ‘Angle‐Resolved XPS: The Current Status and Future Prospects for Angle‐resolved XPS of Nano and Subnano Films’ is given, which was held at the Riviera Maya, Mexico, 26–30 March 2007, under the main sponsorship of the International Union for Vacuum Science, Technique and Applications (IUVSTA). Angle‐resolved X‐ray photoelectron spectroscopy (ARXPS) can provide detailed chemical as well as depth profile information about the near‐surface composition of materials and thin films. This workshop was held to review the present status and level of understanding of Angle‐resolved XPS, and to stimulate discussions leading to a deeper understanding of current problems and new solutions. The main goal of the workshop was to find better ways to perform experiments and, very importantly, better ways to extract information from the experimental data. This report contains summaries of presentations and discussions that were held in sessions entitled ‘Basics and Present Limits of ARXPS’, the Analysis of ARXPS Data, Applications of ARXPS, Equipment for ARXPS, and Future Developments in ARXPS'. There were 33 participants at the workshop. Copyright © 2009 John Wiley & Sons, Ltd. |
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| Keywords: | X‐ray photoelectron spectroscopy angle‐resolved X‐ray photoelectron spectroscopy surface analysis near‐surface analysis non‐destructive depth profiling maximum entropy stratification IUVSTA workshop XPS ARXPS hard X‐ray photoemission |
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