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Surface excitation parameter for 12 semiconductors and determination of a general predictive formula
Authors:N. Pauly  S. Tougaard
Affiliation:1. Senior Research Assistant (FNRS), Université Libre de Bruxelles, Service de Métrologie Nucléaire (CP 165/84), 50 av. F. D. Roosevelt, B‐1050 Brussels, Belgium;2. Department of Physics and Chemistry, University of Southern Denmark, DK‐5230 Odense M, Denmark
Abstract:The surface excitation parameter (SEP) is theoretically calculated for 12 semiconductors (GaN, GaP, GaSb, GaAs, InSb, InAs, InP, SiC, ZnSe, ZnS, Si and Ge) and for Ni (which is usually used as a reference in experiments) for electron energies between 300 eV and 3400 eV, and for angles between 0° and 70° to the surface normal. We use our previous definition of SEP, as the change in excitation probability, for an electron, caused by the presence of the surface in comparison with an electron moving the same distance in an infinite medium. The calculations are performed within the dielectric response theory by means of the QUEELS‐ε(k, ω)‐REELS software determining the energy‐differential inelastic electron scattering cross‐sections for reflection‐electron‐energy‐loss spectroscopy (REELS), and for which the only input is the dielectric function of the medium. By fitting to these SEP values as well as our previous ones, i.e. from 27 materials, including metals, oxides, polymers and semiconductors, we also establish a simple equation depending on the generalized plasmon energy and the energy band gap of the material which allows to estimate the SEP when the dielectric function is not available. Copyright © 2009 John Wiley & Sons, Ltd.
Keywords:surface excitation parameter  semiconductor
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