50~110 nm波段高反射率多层膜的设计与制备

阐述了50~110 nm强吸收波段亚四分之一波长多层膜的设计方法.这种膜系是由强吸收材料叠加而成，每层膜光学厚度小于四分之一个波长.与常规周期多层膜相比，这种膜系更适用于提高强吸收波段的反射率.利用该方法设计了50 nm处高反射多层膜，并以此为初始条件通过Levenberg-Marquart优化方法完成了50~110 nm强吸收波段宽带高反射率Si/W/Co多层膜的设计，其平均反射率达到45%.采用直流磁控溅射方法制备了Si/W/Co多层膜,用X射线衍射仪(XRD)对膜层结构进行了测试，测试结果表明制作出的多层膜结构与设计结构基本相符.

Design and Fabrication of High Reflection Multilayer for the Wavelength Range 50~110 nm

A design method of sub-quarter-wave multilayers with enhanced normal reflectance in the strong absorbing range 50~110 nm has been presented.The multilayers consisted in the superposition of a few layers of strong absorbing materials.The optical thickness of each layer in the multilayers is less than quarter-wave thickness.Compared to the standard multilayers,this multilayer structure more suits to enhance reflectance of strong absorbing wavelength range.High reflectance multilayers Si/W/Co was designed at wavelength of 50 nm by using this method,and then optimized based on this initial condition by using Levenberg-Marquart algorithm in a wide wavelength range 50~110 nm.The calculated results suggest that the reflectance of the multilayer is as high as 45%.The sample was fabricated by using a high vacuum direct current magnetron sputtering.Then,the multilayer was characterized by a low angle X-ray diffraction.The results suggest that the fabricated multilayer structure meets the design requirement.