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Study of a 4H-SiC epitaxial n-channel MOSFET
引用本文:汤晓燕,张玉明,张义门. Study of a 4H-SiC epitaxial n-channel MOSFET[J]. 中国物理 B, 2010, 19(4): 47204-047204. DOI: 10.1088/1674-1056/19/4/047204
作者姓名:汤晓燕  张玉明  张义门
作者单位:School of Microelectronics, Key Laboratory ofWide Band-Gap Semiconductor Materials and Devices, Xidian University, Xi'an {rm710071, China
基金项目:Project supported by the NationalNatural Science Foundation of China (Grant No.~60876061) andAdvanced Research Foundation (Grant No.~51308040302).
摘    要:Epitaxial channel metal-oxide semiconductor field-effecttransistors (MOSFETs) have been proposed as one possible way toavoid the problem of low inversion layers in traditional MOSFETs.This paper presents an equation of maximum depletion width modifiedwhich is more accurate than the original equation. A 4H--SiC epitaxialn-channel MOSFET using two-dimensional simulator ISE is simulated.Optimized structure would be realized based on the simulated resultsfor increasing channel mobility.

关 键 词:SiC  epitaxial  layer  MOSFET  mobility
收稿时间:2009-07-13

Study of a 4H-SiC epitaxial n-channel MOSFET
Tang Xiao-Yan,Zhang Yu-Ming and Zhang Yi-Men. Study of a 4H-SiC epitaxial n-channel MOSFET[J]. Chinese Physics B, 2010, 19(4): 47204-047204. DOI: 10.1088/1674-1056/19/4/047204
Authors:Tang Xiao-Yan  Zhang Yu-Ming  Zhang Yi-Men
Affiliation:School of Microelectronics, Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices, Xidian University, Xi'an 710071, China
Abstract:Epitaxial channel metal-oxide semiconductor field-effecttransistors (MOSFETs) have been proposed as one possible way toavoid the problem of low inversion layers in traditional MOSFETs.This paper presents an equation of maximum depletion width modifiedwhich is more accurate than the original equation. A 4H--SiC epitaxialn-channel MOSFET using two-dimensional simulator ISE is simulated.Optimized structure would be realized based on the simulated resultsfor increasing channel mobility.
Keywords:SiC   epitaxial layer   MOSFET   mobility
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