| Aluminum film microdeposition at 775 nm by femtosecond laser-induced forward transfer |
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| 作者姓名： | 杨丽 王清月 倪晓昌 巫殷忠 贾威 柴路 |
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| 作者单位： | School of Science Civil Aviation University of China，Ultrafast Laser Laboratory，School of Precision Instruments and Optoelectronics Engineering，Tianjin University，Ultrafast Laser Laboratory，School of Precision Instruments and Optoelectronics Engineering，Tianjin University，Ultrafast Laser Laboratory，School of Precision Instruments and Optoelectronics Engineering，Tianjin University，Ultrafast Laser Laboratory，School of Precision Instruments and Optoelectronics Engineering，Tianjin University，Ultrafast Laser Laboratory，School of Precision Instruments and Optoelectronics Engineering，Tianjin University，Tianjin 300300 Ultrafast Laser Laboratory，School of Precision Instruments and Optoelectronics Engineering，Tianjin University，Tianjin 300072 Key Laboratory of Optoelectronic Information Technical Science，Ministry of Education of China，Tianjin 300072，Tianjin 300072 Key Laboratory of Optoelectronic Information Technical Science，Ministry of Education of China，Tianjin 300072，Tianjin 300072 Key Laboratory of Optoelectronic Information Technical Science，Ministry of Education of China，Tianjin 300072，Tianjin 300072 Key Laboratory of Optoelectronic Information Technical Science，Ministry of Education of China，Tianjin 300072，Tianjin 300072 Key Laboratory of Optoelectronic Information Technical Science，Ministry of Education of China，Tianjin 300072，Tianjin 300072 Key Laboratory of Optoelectronic Information Technical Science，Ministry of Education of China，Tianjin 300072 |
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| 基金项目： | This work was supported by the Key Grant Project of the Ministry of Education of China (No. 10410)，the Science and Technology Development Project Fund of Tianjin (No. 043103911)，the Science Research Start-Up Fund of Civil Aviation University (No. qd02x11). |
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| 摘 要： | Micro-deposit ion of an aluminum film of 500-nm thickness on a quartz substrate was demonstrated by laser-induced forward transfer (LIFT) using a femtosecond laser pulse. With the help of atomic force microscopy (AFM) and scanning electron microscopy (SEM), the dependence of the morphology of deposited aluminum film on the irradiated laser pulse energy was investigated. As the laser fluence was slightly above the threshold fluence, the higher pressure of plasma for the thicker film made the free surface of solid phase burst out, which resulted in that not only the solid material was sputtered but also the deposited film in the liquid state was made irregularly.
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