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电子束曝光中的蒙特卡罗方法
引用本文:魏茂新,王建琨,乔谊正.电子束曝光中的蒙特卡罗方法[J].计算物理,1986,3(4):415-423.
作者姓名:魏茂新  王建琨  乔谊正
作者单位:山东工业大学电子束研究室
摘    要:本文用蒙特卡罗方法模拟了散射电子束在PMMA电子束胶层中的能量沉积分布。为兼顾节约计算机CPU运行机时和物理概念的严谨性而提出了混合式步长的模拟方法。在处理电子穿越胶-衬底的边界时,本文采用宁一种几率确定法,用以判断电子是否在界面处发生一次弹性散射。得出了电子在胶层中的前散射和背散射的能量沉积分布图。

收稿时间:1986-03-13

THE COMPUTER MONTE CARLO SIMULATION IN ELECTRON BEAM EXPOSURE
Wei Mao-xin,Wang Jian-kun,Qiao Yi-zeng.THE COMPUTER MONTE CARLO SIMULATION IN ELECTRON BEAM EXPOSURE[J].Chinese Journal of Computational Physics,1986,3(4):415-423.
Authors:Wei Mao-xin  Wang Jian-kun  Qiao Yi-zeng
Institution:Electron Beam Lab. Shandong Polytechnic University
Abstract:The spatial distribution of the energy deposition in polymer resist PMMAby lateral tcattering electrons is simulated with Monte Carlo method. The combination of the scattering mean free path and the constant step value is proposed, for making a compromise between the physics concept and the computer runtime.A new approch that whether or not an elastic scattering event occurs on the boundary is determined by a randum number is utilized. The graphs of both forward scattering energy deposition and backward energy deposition have been given in the present paper.
Keywords:
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