Ti~+离子注入结合热退火法制备TiO_2纳米薄膜研究

利用金属蒸发真空多弧离子源(MEVVA源)注入机将Ti+离子注入到高纯石英玻璃衬底中,离子注入的加速电压为20 k V,注入剂量为1.5×1017和3×1017ions/cm2,将注入样品在氧气气氛下进行热退火处理,制备了TiO2纳米薄膜。采用光吸收谱、拉曼光谱、X射线光电子能谱、扫描电子显微镜和透射电子显微镜对注入样品进行了测试和表征,分析了TiO2薄膜的形成机理。在热退火过程中衬底中离子注入的Ti原子向外扩散到衬底表面被氧化形成了TiO2。TiO2的形成、晶粒尺寸和晶体结构依赖于热退火温度,而形成TiO2薄膜的厚度主要受离子注入剂量和热退火时间的影响。实验结果表明,该方法制备的TiO2纳米薄膜将有望应用于制备具有光催化、自清洁等特殊性能的自清洁玻璃。

Fabrication of TiO2 Nanofilms by Ti+ Ion Implantation and Subsequent Thermal Annealing

TiO₂ nanofilms on the surface of fused silica have been fabricated by Ti+ ion implantation and subsequent thermal annealing in oxygen ambience. The silica glasses were implanted by Ti+ ions at 20 kV with fluences of 1.5 and 3x1017 ions/cm2 using a metal vapor vacuum arc (MEVVA) ion source implanter. The optical absorption spectroscopy, Raman scattering spectroscopy, X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), and transmission electron microscopy (TEM) measurements were done to figure out formation mechanism of the TiO₂ nanofilms. The formation of TiO2 nanofilms resulted from outdiffusion of the implanted Ti ions to the substrate surface, where they were oxidized intoTiO₂. The formation,grain size and the crystallographic phase of TiO₂ are annealing temperature dependent, and TiO₂ nanofilm thickness can be well tailored by controlling the implantation fluence and annealing time. Results show that the TiO₂ nanofilms fabricated by this novel method have great potential in applications such as photocatalytic,antibacterial and self-cleaning glass.