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Short-Range Order in Amorphous and Crystalline Ferroelectric Hf |
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| Authors: | S. B. Erenburg S. V. Trubina K. O. Kvashnina V. N. Kruchinin V. V. Gritsenko A. G. Chernikova A. M. Markeev |
| Affiliation: | 1.Nikolaev Institute of Inorganic Chemistry, Siberian Branch,Russian Academy of Sciences,Novosibirsk,Russia;2.Institute of Nuclear Physics, Siberian Branch,Russian Academy of Sciences,Novosibirsk,Russia;3.ESRF,Grenoble,France;4.HZDR,Institute of Resource Ecology,Dresden,Germany;5.Rzhanov Institute of Semiconductor Physics, Siberian Branch,Russian Academy of Sciences,Novosibirsk,Russia;6.Novosibirsk State University,Novosibirsk,Russia;7.Novosibirsk State Technical University,Novosibirsk,Russia;8.Moscow Institute of Physics and Technology,Dolgoprudnyi, Moscow oblast,Russia |
| Abstract: | The microstructures of amorphous and polycrystalline ferroelectric Hf0.5Zr0.5O2 films are studied by X-ray spectroscopy and ellipsometry. EXAFS spectra demonstrate that the amorphous film consists of an “incompletely mixed” solid solution of metallic oxides HfO2 and ZrO2. After rapid thermal annealing, the mixed Hf0.5Zr0.5O2 oxide films have a more ordered polycrystalline structure, and individual Hf and Zr monoxide islands are formed in the films. These islands are several nanometers in size and have a structure that is similar to the monoclinic structure of HfO2 and ZrO2. The presence of the HfO2 and ZrO2 phases in the Hf0.5Zr0.5O2 films is also detected by ellipsometry. |
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