High-fidelity solvent-resistant replica molding of hydrophobic polymer surfaces produced by femtosecond laser nanofabrication |
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Authors: | De Marco Carmela Eaton Shane M Levi Marinella Cerullo Giulio Turri Stefano Osellame Roberto |
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Institution: | Dipartimento di Chimica, Materiali e Ingegneria Chimica Giulio Natta, Politecnico di Milano, Piazza Leonardo da Vinci 32, 20133 Milan, Italy. carmela.demarco@chem.polimi.it |
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Abstract: | We demonstrate that hydrophobic areas formed by femtosecond laser irradiation on poly(methyl methacrylate) (PMMA) and polystyrene (PS) polymer substrates can be faithfully replicated on samples of the same material via a solvent-resistant perfluoropolyether (PFPE) elastomer mold. The replicated PMMA and PS samples show nearly identical micro-nanoscale topography and hydrophobic wetting characteristics as the laser-patterned master substrates. This work combines the femtosecond laser capability of spatially tailoring the wettability with a high-resolution parallel replication method, offering the potential for the efficient production of microfluidic devices with selectively tailored flow behavior. |
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