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High-fidelity solvent-resistant replica molding of hydrophobic polymer surfaces produced by femtosecond laser nanofabrication
Authors:De Marco Carmela  Eaton Shane M  Levi Marinella  Cerullo Giulio  Turri Stefano  Osellame Roberto
Institution:Dipartimento di Chimica, Materiali e Ingegneria Chimica Giulio Natta, Politecnico di Milano, Piazza Leonardo da Vinci 32, 20133 Milan, Italy. carmela.demarco@chem.polimi.it
Abstract:We demonstrate that hydrophobic areas formed by femtosecond laser irradiation on poly(methyl methacrylate) (PMMA) and polystyrene (PS) polymer substrates can be faithfully replicated on samples of the same material via a solvent-resistant perfluoropolyether (PFPE) elastomer mold. The replicated PMMA and PS samples show nearly identical micro-nanoscale topography and hydrophobic wetting characteristics as the laser-patterned master substrates. This work combines the femtosecond laser capability of spatially tailoring the wettability with a high-resolution parallel replication method, offering the potential for the efficient production of microfluidic devices with selectively tailored flow behavior.
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