| 用Ti（OC3H7）4制备Ti（CN）涂层研究 |
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| 引用本文： | 石玉龙,彭红瑞.用Ti（OC3H7）4制备Ti（CN）涂层研究[J].真空电子技术,1998(5):36-39. |
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| 作者姓名： | 石玉龙 彭红瑞 |
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| 作者单位： | 青岛化工学院等离子体表面技术研究所 |
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| 摘 要： | 文章叙述了采用金属有机物四异丙基钛（Ｔｉ［ＯＣ３Ｈ７］４］为钛温，在外加热ＰＣＶＤ设备上沉积Ｔｉ（ＣＮ）涂层。并对涂层进行了其显微硬度测量，扫描电镜（ＳＥＭ）观察和Ｘ射线衍射（ＸＲＤ）分析。结果表明，此法制备的Ｔｉ（ＣＮ）涂层其显微硬度可达标１５６００Ｎ／ｍｍ２，膜层结构仍为在状晶，Ｔｉ（ＣＮ）晶体的ｄ（２００）随着炉温的升高和Ｈ２．Ｎ２比的增大在逐渐变化。
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| 关 键 词： | 金属有机物，等离子体，四异丙基钛，碳氮化钛，显微分析 |
Preparation of Ti(CN)Coatings with Ti(OC3H7)4 |
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| Shi Yulong,Pen Hongrui,Li Shizhi.Preparation of Ti(CN)Coatings with Ti(OC3H7)4[J].Vacuum Electronics,1998(5):36-39. |
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| Authors: | Shi Yulong Pen Hongrui Li Shizhi |
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| Abstract: | The use of metallo-organic compound Ti(OC3H7)4 with auxiliary heating plasma assisted CVD of Ti (CN) coating is reported. The Ti(CN ) coatings were analyzed with SEM and XRD. The maximal microhardness value is 15 600 N/mm2, the morphology of coatings is columnar structure,and the d(200)-valuls of Ti(CN) films changed with the oven temperature and the ratio of H2 to N2. |
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| Keywords: | Metallo-organic compound Plasma Ti (OC3H7)4 Ti (CN) Micro- analysis |
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