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Charge Loss Characteristics of Different Al Contents in a HfA10 Trapping Layer Investigated by Variable Temperature Kelvin Probe Force Microscopy
Authors:ZHANG Dong  HUO Zong-Liang  JIN Lei  HAN Yu-Long  CHU Yu-Qiong  CHEN Guo-Xing  LIU Ming  YANG Bao-He
Institution:[1]Tianjin Key Laboratory of Film Electronic and Communication Devices, Tianjin University of Technology, Tianjin 300384 [2]Institutes of Microelectronics, Chinese Academy of Sciences, Beijing 100029
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