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Influence of Rapid Thermal Annealing on the Structure and Electrical Properties of Ce-Doped HfO2 Gate Dielectric |
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| Authors: | MENG Yong-Qiang LIU Zheng-Tang FENG Li-Ping CHEN Shuai |
| Institution: | State Key Lab of Solidification Processing, College of Materials Science and Engineering, Northwestern Polytechnical University, Xi'an 710072 |
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