原子氢、氘钝化以及质子注入掺杂硅的红外吸收

用FTIR研究了原子氢、原子氘钝化掺硼硅以及质子注入掺杂单晶硅,当原子氘钝化条件不同时分别产生了1360cm^-1和1263cm^-1的[BD]对局域振动模红外吸收带,这表明氘在单晶硅的硼受主邻近有两种可能的状态。质子注入掺杂硅的红外吸收光谱与不掺杂硅的明显不同,氢原子优先结合于硼的附近,注入氢仅约1%生成光效的缺陷,而绝大部份生成无光效的中心,它们可能是氢分子。关键词：

INFRARED ABSORPTION OF DOPED SILICON PASSIVATED BY ATOMIC HYDROGEN, DEUTERIUM AND IMPLANTED BY PROTON

FTIR was employed to study doped silicon passivated by atomic hydrogen, deuterium and implanted by proton. The localized vibrational modes of [BD] pairs, 1.560 cm^-1 and 1263 cm^-1, were excited with different passivation conditions of atomic deuterium. This shows that there are at least two possible positions for deuterium atoms around acceptor B. IR absorption spectra of doped silicon implanted by proton are different from that of undoped silicon, the hydrogen atoms prefer bonding around B acceptors. Only 1% implanted hydrogen atoms were turned into photoactive centers, most of implanted hydrogen atoms formed non-photoactive cen-ters, they might be hydrogen molecules, Hz.