| Abstract: | An experimental 400 Kev heavy ion implanter has been constructed and put into operation in the Department of Physics, the Peking Normal University. The equipment works on a system of acceleration, analysis, scan, and acceleration (or deceleration). It is composed of the radiofrequency heavy ion source, the front accelerating system, the double focusing symmetrical magnet, the deflexion scanning system, the post-accelerating tube, and the target chamber. The deflecting angle of the magnet is 90°. At present, more than twenty different species of ion beam, such as B, P, As, Al, Mg, Zn, Hg, etc. have been extracted. The extracted ions are used in research work on semiconductors, metals, and superconductive materials. The beam current on the target ranges between 10 μA and 200 μA, and the doping uniformity is ±1.4%. |
