| 用近贴式软X射线光刻术研究DCPA光刻胶的曝光性能 |
| |
| 引用本文： | 郭玉彬,慎微.用近贴式软X射线光刻术研究DCPA光刻胶的曝光性能[J].光子学报,1995,24(3):249-257. |
| |
| 作者姓名： | 郭玉彬 慎微 |
| |
| 作者单位： | 中国科学院长春光学精密机械研究所，应用光学国家重点实验室，化工部无锡化工研究设计院 |
| |
| 摘 要： | 采用软X射线近贴式光刻术,对DCPA光刻胶的曝光性能进行了系统研究,得到了一些新的实验结果。
|
| 关 键 词： | 软X射线 近贴式 光刻胶 光刻术 |
| 收稿时间： | 1994-03-28 |
INVESTIGATION ON EXPOSURE CHARACTERISTICS 0F SOFT-X-RAY RESIST DCPA USING SOFT X-RAY CONTACT LITHOGRAPHY |
| |
| Guo Yubin,Li Futian,Tang Jiuhua,Li Jia State Key Lab.of Applied Optics,Changchun Institute of Optics and Fine Mechanics,Academia Sinica,Changchun Shen Wei,Du Yongxing Ministry of Chemical Industry,Wuxi Institute of Chemical Engineering,Wuxi.INVESTIGATION ON EXPOSURE CHARACTERISTICS 0F SOFT-X-RAY RESIST DCPA USING SOFT X-RAY CONTACT LITHOGRAPHY[J].Acta Photonica Sinica,1995,24(3):249-257. |
| |
| Authors: | Guo Yubin Li Futian Tang Jiuhua Li Jia State Key Labof Applied Optics Changchun Institute of Optics and Fine Mechanics Academia Sinica Changchun Shen Wei Du Yongxing Ministry of Chemical Industry Wuxi Institute of Chemical Engineering Wuxi |
| |
| Institution: | Guo Yubin,Li Futian,Tang Jiuhua,Li Jia State Key Lab.of Applied Optics,Changchun Institute of Optics and Fine Mechanics,Academia Sinica,Changchun 130022 Shen Wei,Du Yongxing Ministry of Chemical Industry,Wuxi Institute of Chemical Engineering,Wuxi 214031 |
| |
| Abstract: | The exposure characteristics of soft X-ray resist DCPA were investigated using soft X-raycontact lithography. Some new results are obtined. |
| |
| Keywords: | Soft X-ray Contact Resist Lithography |
| 本文献已被 CNKI 维普 等数据库收录！ |
| 点击此处可从《光子学报》浏览原始摘要信息 |
| 点击此处可从《光子学报》下载免费的PDF全文 |
|
