| 氧化锌薄膜的研究与开发进展 |
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| 引用本文： | 赵谢群,林鸿溢.氧化锌薄膜的研究与开发进展[J].半导体技术,1998,23(6):8-12. |
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| 作者姓名： | 赵谢群 林鸿溢 |
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| 作者单位： | [1]北京有色金属研究总院 [2]北京理工大学电子工程系 |
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| 摘 要： | 阐述了ＺｎＯ薄膜材料的结构特点，电学性质和光学特性。分析了薄膜研制、应用与开发现状，展望了产业化发展前景。
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| 关 键 词： | 制备技术 应用 氧化锌薄膜 |
Development and Applications for Zinc Oxide Thin Film |
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| Zhao Xiequn,Qiu Xiangdong.Development and Applications for Zinc Oxide Thin Film[J].Semiconductor Technology,1998,23(6):8-12. |
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| Authors: | Zhao Xiequn Qiu Xiangdong |
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| Abstract: | The development of the micro structural,electrical and optical properties of zinc oxide thin film is introduced.The preparation methods,such as magnetron sputtering,pulsed laser ablation,chemical vapor deposition,sol gel synthesis,and spray pyrolysis are described respectively.The application of the film and its industrialization prospect will be reviewed as well. |
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| Keywords: | ZnO thin film Preparation Application |
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