ECRCVD技术淀积太阳电池的减反膜

本文报道了用电子回旋共振化学气相淀积(ECRCVD)技术实现了低温(50℃)淀积SiON/SiN膜作硅太阳电池减反射膜的实验研究.探讨了影响薄膜性能的主要工艺参数,设计了具有较佳抗反效果的双层减反膜,并对膜层的反射率和太阳电池参数进行了测定.结果表明:该减反膜具有良好的减反效果,能实现较宽波段范围内的均匀增透,使太阳电池短路电流密度提高了42%,电池转换效率提高了45%.

ECRCVD OF ANTIREFLECTION COATINGS FOR SI SOLAR CELLS

Silicon oxynitride and silicon nitride double layer antireflection(AR) coatings for St solar cells are prepared by the electron cyclotron resonance chemical vapor deposition(ECRCVD)method at low substrate temperature (50℃). The AR coatings for silicon cells have been optimized theoritically and the mechanism of ECRCVD of SiON/SiN film growth is studied thoroughly by varying process parameters,such as substrate temperature,reactant gas ratio and total pressure,etc. The parameters of St cells with double-layer AR coatings are measured. The results show that the antireflection performance of the film is. good and the SiON/SiN coatings improve the short-circuit current(J_sc)by 42%, achieving 27mA/cm², opencircuit voltage (V_oc) by 3%, to be 680mV, and the practicalconversion efficiency by 45%.