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Recent achievements in AMMONO-bulk method
Authors:R. Dwiliński  R. Doradziński  J. Garczyński  L. Sierzputowski  R. Kucharski  M. Zając  M. Rudziński  R. Kudrawiec  J. Serafińczuk  W. Strupiński
Affiliation:1. AMMONO sp. z.o.o., Czerwonego Krzy?a 2/31, 00-377 Warsaw, Poland;2. Institute of Electronic Materials Technology, Wólczyńska 133, 01-919 Warsaw, Poland;3. Institute of Physics, Wroclaw University of Technology, Wybrze?e Wyspiańskiego 27, 50-370 Wroc?aw, Poland;4. Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372 Wroc?aw, Poland
Abstract:In this paper we present progress made recently in the development of the growth of truly bulk GaN crystals by the ammonothermal method in basic environment. High quality 2-in c-plane GaN seeds are shown. Non-polar wafers can also be cut out from thick GaN crystals grown by ammonothermal method. Perfect crystallinity manifests in very narrow peaks in X-ray rocking curves (the full width at half maximum equals about 15 arcsec). GaN epilayers deposited on these substrates exhibit intrinsic narrow exciton lines, which are very sensitive to the optical selection rules typical for hexagonal symmetry, proving the truly non-polar character of such AMMONO-GaN substrates. Other challenges like homogenous insulating properties or high p-type conductivity have been also accomplished by means of ammonothermal method. Semi-insulating crystals of resistivity up to 1011 Ω cm and p-type conductivity within hole concentration up to 1018 cm−3 are already available in diameters up to 1.5-in.
Keywords:A2. Growth from solutions   A2. Metalorganic vapor phase epitaxy   B1. Nitrides   B2. Semiconducting III-V materials
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