首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Subtle interplay between polytypism and preferred growth direction alignment in GaN nanorods non-catalytically grown on Si(1 1 1) substrates by using hydride vapor phase epitaxy
Authors:Sanghwa Lee  Taegeon Oh  Boa Shin  Chinkyo Kim  Dong Ryeol Lee  Hyun-Hwi Lee
Institution:1. Department of Physics and Research Institute for Basic Sciences, Kyung Hee University, 1 Hoegi-dong Dongdaemun-gu, Seoul 130–701, Republic of Korea;2. Department of Physics, Soongsil University, Seoul 156–743, Republic of Korea;3. Pohang Accelerator Laboratory (PAL), Pohang University of Science and Technology (POSTECH), Pohang 790–784, Republic of Korea
Abstract:GaN nanorods were grown on Si(1 1 1) substrates by using hydride vapor phase epitaxy, and the crystallographic characteristics associated with their preferred growth directions were investigated by utilizing synchrotron X-ray reciprocal space mapping in a grazing incidence geometry and scanning electron microscopy. Crystallographic analysis reveals that the nanorods containing both wurtzite and zinc blende phase tend to have narrower distribution of the preferred growth directions than those containing only wurtzite phase. This tendency is partly attributed to the subtle interplay between polytypism and the preferred growth directions of GaN nanorods.
Keywords:A1  Nucleation  A1  X-ray diffraction  A3  Hydride vapor phase epitaxy  B1  Nitrides
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号