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Improvement of crystal quality in ammonothermal growth of bulk GaN
Authors:Tadao Hashimoto  Edward LettsMasanori Ikari  Yoshihiro Nojima
Affiliation:SixPoint Materials, Inc., Buellton, CA 93427, USA
Abstract:Several key improvements in crystal quality of bulk GaN grown by the ammonothermal method are presented. Full width at half maximum of (0 0 2) X-ray rocking curve was reduced to 53 and 62 arcsec for Ga-side and N-side, respectively. Transparent bulk GaN crystal was also demonstrated. Oxygen and sodium concentrations were reduced to mid-1018 and mid-1015 cm−3, respectively. We are currently searching for a growth condition that produces transparent bulk GaN with high structural quality and low impurities. Small-sized, semi-transparent GaN wafers were fabricated by slicing the grown bulk GaN crystals, which demonstrate the high feasibility of ammonothermal growth for production of GaN wafers.
Keywords:A2. Growth from solutions   A2. Single crystal growth   B1. Nitrides   B1. Semiconducting gallium compounds
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