首页 | 本学科首页   官方微博 | 高级检索  
     

Analysis and Optimal Design of a Novel SiGe/Si Power Diode for Fast and Soft Recovery
作者姓名:高勇 马丽
作者单位:[1]DepartmentofElectronicEngineering,Xi'anUniversityofTechnology,Xi'an710048 [2]DepartmentofAppliedPhysics,Xi'anUniversityofTechnology,Xi'an710048
摘    要:We propose a novel p (Si1-xGex)-n^--n^ hetero-junction power diode with three-step gradual changing doping concentration in the base region,and the structure mechanism is analysed.The fast and soft reverse recovery characteristics have been obtained and the optimal design of the changing doping concentration gradient andthe percentage of Ge is carried out.Compared to the conventional structure of p^ (Si1-xGex)-n^--n^ with a constant doping concentration,the softness factor S increases nearly two times,the reverse recovery time and the peak reverse current are reduced over 15% for the device with the optimized concentration gradient,while the forward drop is almost unchanged.Taking into account of the improvement of the whole characteristics of the novel device,we obtain the optimal percentage of Ge to be 20%.

关 键 词:锗化硅 硅 二极管设计 异质结 半导体材料
本文献已被 维普 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号