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Hydrogenation Properties of Zr Films Under Various Conditions of Hydrogen Plasma
作者姓名:晏国强 罗顺忠 等
作者单位:[1]AppliedIonBeamPhysicsLaboratory,InstituteofModernPhysics,FudanUniversity,Shanghai200433 [2]InstituteofNuclearPhysicsandChemistry,ChinaAcademyofEngineeringPhysics,Chengdu610003
摘    要:The hydrogenation properties of Zr samples with and without an Ni overlayer under various plasma conditions were investigated by means of non-Rutherford backscattering and elastic recoil detection analysis.The theoretical maximum hydrogen capacity,66.7 at%,could be achieved at a hydrogen absolute pressure of-2Pa and a substrate temperature of-393K for a plasma irradiation of only 10min;this was significantly greater than that for gas hydrogenation under the same hydrogen pressure and substrate temperature.It was also found that the C and O contamination on the sample surface strongly influences the hydrogenation,and that the maximum equilibrium hydrogen content drops dramatically with the increasing total contamination.In addition,the influence of the Ni overlayer on the plasma hydrogenation is discussed.

关 键 词:等离子体 Zr薄膜 氢化作用特性
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