| 含三氟甲基聚硅烷的合成及其紫外光降解 |
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| 引用本文： | 朱岩,包华,王庚超,SCHAUER F,KURITKA I.含三氟甲基聚硅烷的合成及其紫外光降解[J].功能高分子学报,2010,23(1). |
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| 作者姓名： | 朱岩 包华 王庚超 SCHAUER F KURITKA I |
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| 作者单位： | 1. 华东理工大学材料科学与工程学院,超细材料制备与应用教育部重点实验室,上海,200237
2. Centre of Polymer Materials,Tomas Bata University in Zlin,TGM 272,B76272 Zlin,Czech Republic |
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| 摘 要： | 用Wurtz法合成了聚甲基苯基硅烷、聚(对三氟甲基苯基)(甲基)-甲基苯基硅烷以及聚(对三氟甲基苯基)(苯基)-甲基苯基硅烷3种聚硅烷。用IR、GPC和荧光光谱对产物进行表征,并研究了其紫外光降解性能。从电子结构角度解释了不同聚硅烷在荧光以及紫外光降解行为方面的差异。结果表明,在苯环对位引入吸电子基团三氟甲基有利于紫外光降解的进行,而苯环的增多则会阻碍紫外光降解。
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| 关 键 词： | Wurtz法 聚硅烷 三氟甲基 紫外光降解 |
Synthesis and UV Degradability of Polysilanes with Trifluoro methyl Group |
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| ZHU Yan,BAO Hua,WANG Geng-chao,SCHAUER F,KURITKA I.Synthesis and UV Degradability of Polysilanes with Trifluoro methyl Group[J].Journal of Functional Polymers,2010,23(1). |
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| Authors: | ZHU Yan BAO Hua WANG Geng-chao SCHAUER F KURITKA I |
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| Institution: | 1.Key Laboratory for Ultrafine Materials of Ministry of Education;School of Materials Science and Engineering;East China University of Science and Technology;Shanghai 200237;China;2.Centre of Polymer Materials;Tomas Bata University in Zlin;TGM 272;B762 72 Zlin;Czech Republic |
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| Abstract: | Polymethylphenylsilane,poly(P-trifluoromethylphenyl)(methyl)-(methylphenyl)silane and poly(p-trifluoromethylphenyl)(phenyl)-(methylphenyl)silane were synthesized through the Wurtz reaction.The polysilanes were characterized by IR,GPC and fluorescence spectroscopy,and their UV degradability was investigated.The difference of the polysilanes in photoluminescence and UV degra-dability was explained on basis of electronic structures.Results show that the introduction of electron-withdrawing groups-CF3 at the para-position of phenyl ring is favored to UV degradation of polysilanes.UV degradation of polysilanes is inhibited with the increasing content of phenyl rings. |
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| Keywords: | Wurtz reaction polysilane trifluoromethyl group UV degradability |
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