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Investigation of Morphology and Chemical Structure of Nanosized Polytetrafluoroethylene Films Deposited on the Surface of Track-Etched Membranes by Plasma Processing |
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| Authors: | L I Kravets V A Altynov M Yu Yablokov A B Gilman V Satulu B Mitu G Dinescu |
| Institution: | 1.Flerov Laboratory of Nuclear Reactions,Joint Institute for Nuclear Research,Dubna, Moscow oblast,Russia;2.Enikolopov Institute of Synthetic Polymer Materials,Russian Academy of Sciences,Moscow,Russia;3.National Institute for Laser,Plasma and Radiation Physics,Magurele, Bucharest,Romania |
| Abstract: | The morphology and chemical structure of nanosized polytetrafluoroethylene films deposited on the surface of track-etched poly(ethylene terephthalate) membranes by means of radiofrequency magnetron sputtering and electron-beam sputtering of the polymer in a vacuum have been studied using atomic force microscopy and X-ray photoelectron spectroscopy. It has been established that the morphology of films formed with the use of these coating techniques varies considerably. This is due to the size of the deposited polymer particles. The particles formed by the electron-beam sputtering of polytetrafluoroethylene are larger than those produced by magnetron sputtering of the polymer. It has been shown that the chemical composition of the films deposited by electron-beam sputtering in a vacuum is more in line with the composition and structure of the initial polymer than the films obtained by radiofrequency magnetron sputtering. |
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