Liquid crystal aligning capabilities on surface-reformed indium-doped zinc oxide films via ion-beam exposure |
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Authors: | Ju Hwan Lee Eun-Mi Kim Gi-Seok Heo Hae-Chang Jeong Dong Hyun Kim Dong Wook Lee |
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Affiliation: | 1. IT Nano Electronic Device Laboratory, Department of Electrical and Electronic Engineering, Yonsei University, Seoul, Republic of Korea;2. National Center for Nanoprocess and Equipment, Korea Institute of Industrial Technology, Gwangju, Republic of Korea |
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Abstract: | We investigated the characteristics of a solution-processed indium-doped zinc oxide (In:ZnO) film formed via ion-beam (IB) irradiation as a liquid crystal (LC) alignment layer. The In:ZnO film was deposited using solution processing and cured at various temperatures. Uniform LC alignment was observed at all curing temperatures in cross-polarised optical microscopy images. A regular pre-tilt angle supported these results and showed homogeneous LC alignment. Several surface analyses were conducted to evaluate the effect of IB irradiation on the In:ZnO film surface. X-ray diffraction analysis showed an amorphous structure both before and after IB irradiation, and physical surface reformation was observed using atomic force microscopy. Root mean square surface roughness was reduced and a smooth surface was achieved after IB irradiation. X-ray photoelectron spectroscopy was used to detect chemical surface reformation. It was found that the IB irradiation broke the metal-oxide bonds and increased the occurrence of oxygen vacancies, which affected the van der Waals forces between the LC molecules and the In:ZnO film surface. Electrical performance was observed to identify the possibility of using the In:ZnO film in LC applications. Enhanced electro-optical performance was measured and zero residual DC voltage which was verified using a capacitance-voltage curve was achieved. |
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Keywords: | Liquid crystal ion-beam exposure solution-processing residual DC indium doped zinc oxide |
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