| X射线微光刻的常规X射线光源实现方法 |
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| 引用本文： | 康士秀.X射线微光刻的常规X射线光源实现方法[J].物理实验,2001,21(2):7-10. |
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| 作者姓名： | 康士秀 |
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| 作者单位： | 中国科技大学天文与应用物理系,合肥,230026 |
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| 摘 要： | 叙述了利用固体靶X射线光源实现X射线微光刻的方法,给出了X射线掩膜、抗蚀剂及X射线曝光的工艺过程和实验结果.
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| 关 键 词： | X射线 光刻 光源 |
| 修稿时间： | 2000年5月29日 |
X-ray micro-lithography using solid target X-ray source |
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| KANG Shi,xiu.X-ray micro-lithography using solid target X-ray source[J].Physics Experimentation,2001,21(2):7-10. |
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| Authors: | KANG Shi xiu |
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| Abstract: | The method of X ray micro lithography using solid target X ray source was introduced.Equipment and processes of resist,X ray mask and exposure were given in detail.Results were shown. |
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| Keywords: | X ray lithography light source |
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