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Molecularly intact and dissociative adsorption of water on clean Cu(1 1 0): A comparison with the water/Ru(0 0 1) system |
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| Authors: | K. Andersson,A. Gó mez,D. Nordlund,H. Ö strö m,O. Takahashi,H. Ogasawara,L.G.M. Pettersson |
| Affiliation: | a Stanford Synchrotron Radiation Laboratory, 2575 Sand Hill Road, Menlo Park, CA 94025, USA b FYSIKUM, Stockholm University, Albanova University Center, S-10691 Stockholm, Sweden c Research School of Physical Sciences and Engineering, Australian National University, Canberra 0200, Australia d Department of Chemistry, Graduate School of Science, Hiroshima University, 1-3-1, Kagamiyama, Higashi-Hiroshima 739-8526, Japan |
| Abstract: | An X-ray photoelectron spectroscopy (XPS) study was undertaken of the water/Cu(1 1 0)-system finding non-dissociative adsorption on clean Cu(1 1 0) at temperatures below 150 K. Thermally induced dissociation of D2O is observed to occur above 150 K, similar to the H2O/Ru(0 0 1) system, with an experimentally derived activation barrier of 0.53-0.56 eV which is very close in magnitude to the derived activation barrier for desorption of 0.50-0.53 eV. X-ray and electron induced damage to the water overlayer was quantified and used to rationalize the results of a recent XPS study of the water/Cu(1 1 0)-system where partial dissociation was observed already at 90 K. |
| Keywords: | Molecule-solid reactions Synchrotron radiation photoelectron spectroscopy Radiation damage Surface chemical reaction Water Copper Ruthenium Low index single crystal surfaces |
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