Wavelet analysis of the surface morphologic of nanocrystalline TiO2 thin films |
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Authors: | Yuan Lin Xue Ping Li Xiao Wen Zhou |
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Institution: | Key Laboratory of Photochemistry, Center for Molecular Sciences, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100080, China |
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Abstract: | Surface morphologies of nanocrystalline TiO2 thin films were studied by analyzing the surface profile of AFM images using wavelet transform method. Based on characterizing the fractal feature and computing the image details at different orientations and resolutions, the surface textures of nanocrystalline TiO2 thin films before and after chemical treatment were examined. The results reveal that titanium isopropoxide treatment leads to an increase of surface roughness. The related mechanism of modification of the microstructure by chemical treatment associated with the improvement of the photocurrent response is discussed. |
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Keywords: | Atomic force microscopy Surface structure morphology roughness and topography Titanium oxide Semiconducting surfaces Surface chemical reaction Fractal surface |
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