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Spectroscopic study of the reaction of tetramethyldisiloxane with a cold remote nitrogen plasma. Effect of dioxygen addition in the reactive mixture
Authors:Ph Supiot  F Callebert  O Dessaux  P Goudmand
Institution:(1) Laboratoire de Physicochimie de l'Energétique et des Plasmas, Université des Sciences et Technologies de Lille, 59655 Villeneuve d'Aseq Cedex, France
Abstract:The interaction of 1,1,3,3-tetramethyldisiloxane with a cold remote nitrogen plasma is studied by visible ultraviolet emission spectroscopy. Evolutions of emissions when dioxygen is added in the remote plasma region are correlated with the previously studied main characteristics of the polymeric deposition. The role of the energy vectors is discussed. New emissions are attributed to the triatomic Si O Si molecule.
Keywords:Cold remote nitrogen plasma  siloxane  plasma polymerization  emission spectroscopy  Si1 O1
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