High energy electron radiation effect on Ni/4H-SiC SBD and Ohmic contact |
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Authors: | Zhang Lin Zhang Yi-Men Zhang Yu-Ming Han Chao Ma Yong-Ji |
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Affiliation: | School of Microelectronics and Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices, Xidian University, Xi'an 710071, China |
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Abstract: | The Ni/4H-SiC Schottky barrier diodes (SBDs) and transfer lengthmethod (TLM) test patterns of Ni/4H-SiC Ohmic contacts werefabricated, and irradiated with 1~MeV electrons up to a dose of3.43$times 10^{14}$~e/cm$^{ - 2}$. After radiation, the forwardcurrents of the SBDs at 2~V decreased by about 50{%}, and thereverse currents at $-200$~V increased by less than 30{%}. Schottkybarrier height ($phi _{rm B} )$ of the Ni/4H-SiC SBD increasedfrom 1.20~eV to 1.21~eV under 0~V irradiation bias, and decreasedfrom 1.25~eV to 1.19~eV under $-30$~V irradiation bias. Thedegradation of $phi _{rm B} $ could be explained by the variationof interface states of Schottky contacts. The on-state resistance($R_{rm s}$) and the reverse current increased with the dose, whichcan be ascribed to the radiation defects in bulk material. Thespecific contact resistance ($rho _{rm c})$ of the Ni/SiC Ohmiccontact increased from 5.11$times 10^{ -5}~{Omega}cdot$,cm$^{2}$ to 2.97$times $10$^{ -4}~{Omega}cdot$,cm$^{2}$. |
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Keywords: | silicon carbide Schottkybarrier diode Ohmic contact electron radiation |
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