Dissociation of a product of a surface reaction in the gas phase: XeF2 reaction with Si |
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Authors: | Hefty R C Holt J R Tate M R Gosalvez D B Bertino M F Ceyer S T |
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Institution: | Department of Chemistry, Massachusetts Institute of Technology, Cambridge, MA 02139, USA. |
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Abstract: | Xenon difluoride interacts with Si(100)2 x 1 by atom abstraction, whereby a dangling bond abstracts a F atom from XeF2, scattering the complementary XeF. Partitioning of the reaction exothermicity produces sufficient XeF rovibrational excitation for dissociation to occur. The resulting F and Xe atoms are shown to arise from dissociation of XeF in the gas phase by demonstrating that the angle-resolved velocity distributions of F, Xe, and XeF conserve momentum, energy, and mass. This experiment documents the first observation of dissociation of a surface reaction product in the gas phase. |
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