Resonance microwave photoresistance of a two-subband electron system at large filling factors |
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Authors: | A A Bykov E G Mozulev and A K Kalagin |
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Institution: | 1.Institute of Semiconductor Physics, Siberian Branch,Russian Academy of Sciences,Novosibirsk,Russia;2.Novosibirsk State University,Novosibirsk,Russia |
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Abstract: | The microwave photoresistance of a double GaAs quantum well with two occupied size-quantization sub-bands E
1 and E
2 has been studied at the temperatures T = 1.6–4.2 K in the magnetic fields B < 0.5 T. The microwave photoresistance of such a system has been found to have a maximum amplitude when the maximum of the
magneto-intersubband oscillations with the number k = (E
2 − E
1)ℏωc coincides with the maximum or minimum of the ω/ωc oscillations, where ω is the microwave frequency and ωc is the cyclotron frequency. It has been shown that the resonance photoresistance that appears in the kth maximum of the magneto-intersubband oscillations is determined by the condition ℏω/(E
2 − E
1) = (j ± 0.2)/k, where k and j are positive integers. |
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Keywords: | |
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