Surface characterization of plasma deposited nano-structured fluorocarbon coatings for promoting in vitro cell growth |
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Authors: | G.S. Senesi,E. D&rsquo Aloia,P. Favia,R. d&rsquo Agostino |
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Affiliation: | a Dipartimento di Chimica, Università di Bari, Via Orabona 4, I-70126 Bari, Italy b Istituto di Metodologie Inorganiche e dei Plasmi/CNR, c/o Dipartimento di Chimica, Via Orabona 4, I-70126 Bari, Italy |
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Abstract: | Nano-structured “teflon-like” coatings characterized by highly-fluorinated, random, ribbon-shaped, micrometers-long structures were deposited on polyethylenetherephtalate (PET) substrates by plasma enhanced-chemical vapour deposition (PE-CVD) using modulated radiofrequency (RF, 13.56 MHz) glow discharges fed with C2F4 in modulated discharge (MD) and continuous wave (CW) regimes. Surfaces obtained in this way featured identical chemical composition and different roughness in the nanometric scale. Water contact angle (WCA) measurements, scanning electron microscopy (SEM) and atomic force microscopy (AFM) were utilized to characterize the surfaces. A positive relationship was shown to exist between the WCA value and the mean nano-structure height and the area root-mean-square (RMS) roughness of coatings. The possibility of obtaining coatings of varying nano-structure height, i.e., roughness, in a nanometric scale represents a promising result for further use of these surfaces as substrates for experiments on cell adhesion, proliferation and growth. |
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Keywords: | Nano-structured &ldquo teflon-like&rdquo coatings Plasma enhanced-chemical vapour deposition Surface morphology Water contact angle Atomic force microscopy Scanning electron microscopy |
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