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Nitrogen ion implantation in single wall carbon nanotubes
Authors:F. Xu  M. Minniti  C. Giallombardo  A. Cupolillo  P. Barone  A. Oliva  L. Papagno
Affiliation:Dipartimento di Fisica, Università della Calabria, INFN, Gruppo Collegato di Cosenza, 87036 Arcavacata di Rende, Cosenza, Italy
Abstract:We report an X-ray photoemission and electron energy loss study on 3 keV View the MathML source ion implantation in single wall carbon nanotubes. Our results show that nitrogen atoms can bind to carbon in tetrahedral sp3, defects related pyridine-like, and triangular sp2 configurations and such bondings are stable for annealing up to 650 K. Heating at higher temperatures results in preferential substitutional nitrogen doping. This technique opens a new channel for controlled doping in carbon nanotubes for device applications.
Keywords:Ion bombardment   Ion implantation   Photoelectron emission   Nitrogen molecule   Carbon nanotubes
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