Electron-beam exposure of self-assembled monolayers of 10-undecenoic acid期刊界 All Journals 搜尽天下杂志传播学术成果专业期刊搜索期刊信息化学术搜索

Electron-beam exposure of self-assembled monolayers of 10-undecenoic acid

Authors:	M. N. KozickiS. -J. Yang B. W. Axelrod

Affiliation:	1. Department of Psychiatry and Amsterdam Neuroscience, VU University Medical Center and GGZ inGeest, Amsterdam, The Netherlands;2. University of Groningen, University Medical Center Groningen, Department of Neuroscience, Section Cognitive Neuropsychiatry, Groningen, The Netherlands;3. Institute of Psychiatry, Leiden Institute for Brain and Cognition (LIBC), Leiden University, Leiden, The Netherlands;4. Department of Psychiatry, Amsterdam Public Health Institute, VU University Medical Center, Amsterdam, The Netherlands;5. Orygen, The National Centre of Excellence in Youth Mental Health, Melbourne, VIC, Australia;6. Centre for Youth Mental Health, The University of Melbourne, Melbourne, VIC, Australia;1. Laboratory of Gerontology, Department of Zoology, Bangalore University, Bangalore 560 056, Karnataka, India;2. Department of Neurophysiology, National Institute of Mental Health and Neuro Sciences, Bengaluru 560 029, Karnataka, India;3. Department of Life Science, Bangalore University, Bangalore 560 056, Karnataka, India

Abstract:	Tapping mode atomic force microscopy and capacitance versus voltage measurements were employed to study the effects of electron-beam exposure on self-assembled monolayers of 10-undecenoic acid. It was established that exposure increases chemical/mechanical stability, resulting in a thicker layer following a solvent treatment designed to remove residual monomers. Electron exposure also reduces the effects of pinholes in the monolayer, thereby improving dielectric quality.

Keywords:	undecenoic acid monolayer electron-beam.
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