H2/Ar direct current glow discharge mass spectrometry at constant voltage and pressure

The addition of hydrogen to a direct current (dc) - argon glow discharge (GD) coupled to a time of flight mass spectrometer has been studied using a fixed voltage between the electrodes and a fixed discharge pressure. Hydrogen contents investigated were 0.5%, 1% and 10% v/v in the argon discharge and the samples under study consisted of a copper-base, a nickel-base and an iron-base homogeneous materials. Also, the in-depth profile analysis of a tin plate was investigated. Results have shown that hydrogen addition gives rise to significant changes in the slope of the linear relationship between the electrical current and the discharge voltage. Clearly, the electrical resistance of the discharge at the typical operation voltages in the interval 600–1000 V increases with hydrogen added to pure argon.A decrease of the sputtering rates was observed the higher the hydrogen concentrations. Besides, the “reduced sputtering rates”, i.e. the sputtering rates divided by the corresponding electrical current, were also lower for the H₂/Ar discharges than for pure argon. However, the analytical ion signals observed using discharge voltages higher than 900 V turned out to be higher in a 0.5% H₂/Ar discharge than in pure argon for the copper and nickel materials. Besides, for the three samples investigated the ion yields were from 1.5 up to 3 times higher in 0.5% H₂/Ar discharges as compared to the pure argon.Finally, the effect of 0.5% H₂ addition to the Ar discharge on the in-depth profile of a tin plate has also been investigated. As compared to the use of a pure Ar GD, higher sensitivity for major and minor components of the coating were observed without loss of the relative depth resolution achieved.