Growth of anodic oxide films on iron-triad metal monosilicides in sulfuric acid electrolyte

The mechanism and kinetics of electrochemical formation of anodic oxide films on iron-triad metal monosilicides in the 0.5 M H₂SO₄ solution in the potential range of 0.5 to 1.5 V (NHE) were studied by the methods of polarization and impedance measurements. It was concluded that the oxide films on the surface of studied silicides consisted predominantly of SiO₂ and exhibited high barrier properties. The oxide film thickness and specific resistance in relation to the electrode potential were calculated from the impedance data. The constants of oxide film growth were determined.