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CARS study of SiH4−NH3 reaction process in glow discharge plasma |
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| Authors: | K Kajiyama K Saito K Usuda S S Kano S Maeda |
| Institution: | (1) Komatsu Technical Research Center, Shinomiya, 254 Hiratsuka, Japan;(2) Institute for Laser Science, University of Electro-Communications Chofu, 182 Tokyo, Japan;(3) Research Laboratory of Resources Utilization, Tokyo Institute of Technology, Nagatsuta, 227 Yokohama, Japan |
| Abstract: | We have investigated the glow discharge plasma of SiH4–NH3 mixture by CARS. The decomposition rate of NH3 is linearly dependent on SiH4 partial pressure but that of SiH4 is not affected by the mixing ratio. |
| Keywords: | 81 15 Gh 82 42 60 |
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