Photoelectron elastic scattering effects in XPS

The photoelectron elastic scattering effects in XPS are reviewed. Using the transport theory approach and Monte-Carlo calculations as well experimental data, the influence of elastic scattering is demonstrated for the escape probability of the photoelectrons from solids, the intensities from bulk and surface systems, the angular intensity dependence including dipole and quadrupole transitions, attenuation lengths from various definitions, mean escape depths, the path-length distribution of photoelectrons in solids, the overlayer thickness determination, in-depth profiling and photoelectron diffractions patterns from single crystals.