Methoxysilane purification |
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Authors: | Rack H Chung Susan E Hayes |
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Institution: | General Electric Silicone Products Division, Waterford, NY 12188 U.S.A. |
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Abstract: | Distillable nonionic chloride impurities at 50 to 2000 ppm Cl are conveniently removed from alkoxysilanes by treatment with sodium metal. When free of these contaminants, thought to be 2° and 3° alkyl chlorides, MeSi(OMe)3 hydrolyzes substantially more slowly than before treatment. |
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Keywords: | Author to whom correspondence should be addressed |
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