Towards nanometric resolution in multilayer depth profiling: a comparative study of RBS, SIMS, XPS and GDOES |
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Authors: | Ramón Escobar Galindo Raul Gago David Duday Carlos Palacio |
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Institution: | 1. Centro de Micro-Análisis de Materiales, Universidad Autónoma de Madrid, 28049, Madrid, Spain 2. Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas, 28049, Madrid, Spain 3. Département de Science et Analyse des Matériaux, Centre de Recherche Public Gabriel Lippmann, 41 rue du Brill, Belvaux, 4422, Luxembourg 4. Departamento de Física Aplicada, Universidad Autónoma de Madrid, Cantoblanco, 28049, Madrid, Spain
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Abstract: | An increasing amount of effort is currently being directed towards the development of new functionalized nanostructured materials
(i.e., multilayers and nanocomposites). Using an appropriate combination of composition and microstructure, it is possible
to optimize and tailor the final properties of the material to its final application. The analytical characterization of these
new complex nanostructures requires high-resolution analytical techniques that are able to provide information about surface
and depth composition at the nanometric level. In this work, we comparatively review the state of the art in four different
depth-profiling characterization techniques: Rutherford backscattering spectroscopy (RBS), secondary ion mass spectrometry
(SIMS), X-ray photoelectron spectroscopy (XPS) and glow discharge optical emission spectroscopy (GDOES). In addition, we predict
future trends in these techniques regarding improvements in their depth resolutions. Subnanometric resolution can now be achieved
in RBS using magnetic spectrometry systems. In SIMS, the use of rotating sample holders and oxygen flooding during analysis
as well as the optimization of floating low-energy ion guns to lower the impact energy of the primary ions improves the depth
resolution of the technique. Angle-resolved XPS provides a very powerful and nondestructive technique for obtaining depth
profiling and chemical information within the range of a few monolayers. Finally, the application of mathematical tools (deconvolution
algorithms and a depth-profiling model), pulsed sources and surface plasma cleaning procedures is expected to greatly improve
GDOES depth resolution. |
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