| 基于白光干涉无重叠拼接的微结构表征方法 |
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| 引用本文： | 郭彤.基于白光干涉无重叠拼接的微结构表征方法[J].光电子．激光,2010(7):1048-1052. |
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| 作者姓名： | 郭彤 |
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| 作者单位： | 天津大学精密测试技术及仪器国家重点实验室; |
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| 基金项目： | 教育部高校博士点基金(新教师基金)资助项目(20070056072); 科技部国防科技合作与交流资助项目(2008DFA71610); 天津市自然科学基金资助项目(09JCYBJC05300) |
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| 摘 要： | 针对白光干涉技术(WLI)应用于大范围测量时图像重叠拼接会引入误差并降低测量效率这一缺欠,本文基于纳米测量机(NMM)提出了一种无重叠拼接的白光干涉测试方法。利用NMM的高精度定位能力,扩展了普通白光干涉仪的测量范围,实现了对微结构近4倍于CCD视场的大范围测量,验证了无重叠图像拼接的可实现性。
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| 关 键 词： | 微结构 白光干涉技术(WLI) 无重叠图像拼接 大范围 纳米测量机 |
Micro-structures characterization by non-overlapping image stitching of white-light interference |
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| GUO Tong.Micro-structures characterization by non-overlapping image stitching of white-light interference[J].Journal of Optoelectronics·laser,2010(7):1048-1052. |
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| Authors: | GUO Tong |
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| Institution: | GUO Tong,YUAN Fang,GAO Shun-min,MA Long,FU Xing,HU Xiao-tang(State Key Laboratory of Precision Measuring Technology and Instruments,Tianjin University,Tianjin 300072,China) |
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| Abstract: | White light interferometry has become an important method in micro-structure characterization to perform high precision,fast and non-contact measurements.However,with the limit of the field of view of the objective,the large scale measurement can only be achieved by image stitching.In general case,the image stitching will apply overlapping for the collected images,and the superposed image will also introduce noise.In this paper,a new method based on the nano-measuring machine(NMM) and the white light interf... |
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| Keywords: | micro-structures white light interferometry(WLI) non-overlapping image stitching large scale nano-measuring machine(NMM) |
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