1. Department of Materials Science and Engineering, Yonsei University;2. Center for Supramolecular Nano‐Assembly and Department of Chemistry, Yonsei University, Seoul 120‐749 (Korea), Fax: (+82)?2‐393‐6096 http://csna.yonsei.ac.kr
Abstract:
Available in small print : Block copolymer lithography has great potential for reducing the size and fabrication time of integrated circuits. Hydrogen‐bonding‐mediated molecular recognition in self‐assembly processes can be used to produce highly ordered square arrays of block copolymers on the surface of a silicon substrate (see picture).
