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Nanostructured Copper Oxide on Silica–Zirconia Mixed Oxides by Chemical Implantation
Authors:Daniela?Belli Dell'Amico Prof  Helmut Bertagnolli Prof  Fausto Calderazzo Prof  Massimiliano D'Arienzo Dr  Silvia Gross Dr  Luca Labella Prof  Marzio Rancan Dr  Roberto Scotti Prof  Bernd?M Smarsly Prof  Ralf Supplit Dr  Eugenio Tondello Prof  Eric Wendel Dr
Institution:1. Dipartimento di Chimica e Chimica Industriale, Universitá di Pisa, Pisa, via Risorgimento 35, 56126 Pisa (Italy);2. Institut für Physikalische Chemie, Universit?t Stuttgart, Pfaffenwaldring 55, 70569 Stuttgart (Germany);3. Dipartimento di Scienze dei Materiali, Università di Milano‐Bicocca via Cozzi, 53, 20125 Milano (Italy);4. CNR‐ISTM, Dipartimento di Scienze Chimiche, Universitá degli Studi di Padova and INSTM UdR, Padova, via Marzolo, 1, 35131 Padova (Italy);5. Physikalisch‐Chemisches Institut, Justus Liebig Universit?t Giessen, Heinrich‐Buff‐Ring 58, 35392 Giessen (Germany);6. Institut für Materialchemie, Technische Universit?t Wien, 1040 Vienna (Austria), Fax: (+39)?049‐827‐5161
Abstract:A new route to chemical implantation of copper(II) N,N‐dialkylcarbamato complexes on silica and nanostructured silica–zirconia matrices and subsequent thermal treatment (see scheme) is an efficient method of functionalizing the oxide matrices with nanostructured CuO. The materials have been characterized thoroughly and the effect of selected experimental parameters on the grafting reaction was investigated.
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Keywords:copper oxide  grafting  mixed oxides  nanostructures  surface chemistry
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