| 热丝法低温制备多晶硅薄膜微结构的研究 |
| |
| 引用本文： | 王丽春,张贵锋,侯晓多,姜辛.热丝法低温制备多晶硅薄膜微结构的研究[J].人工晶体学报,2007,36(6):1372-1376,1398. |
| |
| 作者姓名： | 王丽春 张贵锋 侯晓多 姜辛 |
| |
| 作者单位： | 大连理工大学材料科学与工程学院三束材料改性国家重点实验室,大连,116024 |
| |
| 基金项目： | 教育部留学回国人员科研启动基金 |
| |
| 摘 要： | 采用热丝化学气相沉积法(HFCVD)在普通玻璃衬底上低温沉积多晶硅薄膜。利用XRD、拉曼光谱和原子力显微镜(AFM)研究了灯丝与衬底间距(5~10mm),灯丝温度(1800~1400℃)和衬底温度(320~205℃)对薄膜晶体取向、晶化率、晶粒尺寸以及形貌的影响规律。结果表明,随着热丝与衬底间距增加,多晶硅薄膜的晶化率和晶粒尺寸明显减小;随热丝温度的降低,薄膜的晶化率都出现了大致相同的规律:先不断增大后突然大幅减小。
|
| 关 键 词： | 热丝化学气相沉积 多晶硅薄膜 择优取向 晶化率 晶体形貌 |
| 文章编号： | 1000-985x（2007）06-1372-05 |
| 收稿时间： | 2007-04-09 |
| 修稿时间： | 2007-07-08 |
Microstructure of Poly-Si Thin Films Prepared by Hot-filament Chemical Vapor Deposition at Low-temperature |
| |
| WANG Li-chun,ZHANG Gui-feng,HOU Xiao-duo,JIANG Xin.Microstructure of Poly-Si Thin Films Prepared by Hot-filament Chemical Vapor Deposition at Low-temperature[J].Journal of Synthetic Crystals,2007,36(6):1372-1376,1398. |
| |
| Authors: | WANG Li-chun ZHANG Gui-feng HOU Xiao-duo JIANG Xin |
| |
| Abstract: | Polycrystalline silicon thin films were prepared by hot-filament chemical vapor deposition(HFCVD) on glass at low-temperatures.The preferential growth orientation,the crystalline fraction and the grain sizes of poly-Si films significantly depend on the filament temperature and the distance of substrate to filament.The effects of deposition parameters on the microstructure of films were characterized by X-ray diffraction(XRD),Raman spectrum and atomic force microscopy(AFM).It was found that the crystalline fraction and the grain sizes of poly-Si films distinctly decreased with the increasing distance of substrate to filament.The crystalline fraction of poly-Si films continuously increased to a maximum value and then rapidly reduced with decreasing filament temperature. |
| |
| Keywords: | HFCVD poly-Si thin film preferential orientation crystalline fraction crystal morphology |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
