| Abstract: | Superthin titanium films of 0.3 to 2 nm thickness, prepared by radio-frequency sputtering, have been studied by modern X-ray methods, such as reflectometry, fluorescent analysis and grasing-beam structural analysis. Two simple models were used to describe early stages of film growth. It has been shown that the thinnest titanium films were the TiO2 islands with an equal height. Thicker films could be described as bilayers Ti/TiO2. The films became continuous already near 1.5 nm effective thickness. |
